Based on the best available microwave plasma technology,
originally developed by ASTeX, Seki CVD reactors are used in both
production and research applications for various purposes. With
over 1,000,000 hrs operation logged at more than 200 sites, our
microwave plasma technology is an attractive option for R&D
scientists wishing to shorten their process development time and
provide themselves with compatibility with other scientists and
publications around the world.
Seki's unique, flexible reactor and patented microwave coupling
design allow microwave processing at high pressure (>10 Torr),
at medium pressure (100 mTorr with optional magnets), and at low
pressure (<10 mTorr with optional magnet and optional streaming
chamber). These CVD systems are used worldwide to grow various materials
which include Carbon and related materials (Diamond, nanocrystalline
diamond and carbon nanotubes, etc.) and non-carbon advanced materials
GaN, SiC, etc. with recent addition of Gallium Oxide and Silicon
wiskers. In particular, exploiting the unique and valuable properties
of diamond, Seki microwave plasma CVD reactors are used for tool
coatings, thermal management, Saw devices, etc. and for various
new applications based on nanocrystalline diamond. |
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