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AX5200 1.5kW Microwave Plasma CVD Integrated System

The model AX5200 Microwave Plasma CVD system incorporates a 1.5kW at 2.45GHz microwave generator for high power and high temperature plasma deposition.

System can also be equipped with optional electromagnets to become an Electron Cyclotron Resonance (ECR) system for operations at low pressure and low temperature.

Both systems are:

	Capable of depositing high quality CVD diamond films for a wide variety of applications
	Flexible reactor design supports high pressure microwave and magnetized microwave CVD
	Development time minimized with supplied CVD diamond process recipes
	Reliable, stable, reproducible, versatile operation
	Modular approach to suit a wide range of budgets
	Manual operations or Computer controlled
	GUI for ease of operation
	Up to 6 different gas inlets
	Pressures from 10 to 150 Torr (1 to 150 Torr optional)
	Substrate Stage Temperature control – heated stage
	Extensive after-sales support

AX5200 1.5kw Integrated Systems

AX5250 5kW Microwave Plasma CVD System

The AX5250 microwave plasma reactor incorporates a 5kW at 2.45GHz microwave generator to produce plasma at high power densities. Such operation allows a new regime of plasma chemistries. In this microwave cavity configuration, liner growth rates on axis up to 15 micro meter an hour for diamond have been demonstrated. Total mass deposition rates of 60mg/hour have been achieved. The process recipe for thick, high growth films is included with the system.

Features:

	Film or thick CVD diamond at deposition rates up to 15 micro meter per hour
	White transparent diamond at growth rates up to 2 to 5 micro meter per hour.
	Accommodates substrates up to 4 inch diameter
	Produce CVD diamond with high thermal conductivity - 10 to 20 W/cm-K
	Operation at 10 to 100 Torr (1 to 100 Torr optional)
	Fully automated for CVD diamond growth for multi-recipe, multi-day operation

AX5250 5kW Integrated Systems

Comparison between 1.5kW and 5kW Microwave Diamond CVD

Microwave Power	1.5kW	5kW
Appropriate applications	Semiconductor device (doping), Homo& Hetero epitaxial films, FED*	Thermal management (Heat Sink), Optical, Tools coating, FED, SAW filters*
Typical Growth rate	0.1 - 0.5 or 1 micron/hr	2 - 5 or 6 micron/hr
Substrate Stage	Heated Stage	Water Cooled Stage
Substrate Temp. Control	Digital Setting	Need shim replacement
BEN***	OK	OK
Grain Size	Small	Small - large
Sample size	50mm (2 inch)±15% uniformity (Guaranteed)	50mm (2 inch) ±15% uniformity (Guaranteed)
Accommodating substrate	90mm (<4 inch)	100mm (4 inch)
Stage Option:	No	Yes (changeable to heating stage)

Field Emission Display*, Surface Acoustic Wave**, Biased Enhanced Nucleation***

AX6500 8kW Microwave Plasma CVD System

The AX6500 produces CVD diamond substrates suitable for most heat-spreading applications. Thick CVD diamond films, to over 3.5 inches in area, enable and expand applications such as laser diode mounts, multi-chip modules, surface acoustic wave devices, and high-power GaAs-based circuits.
The AX6500 is designed for a production environment, with features including: easy loading, push-button operation, low maintenance and high uptime. The AX6500 high deposition rates allow relatively short deposition runs which increases manufacturing flexibility and response time.

The AX6500 combines the most advanced microwave reactor design and high growth rate diamond
deposition process into a turnkey system for pilot production of CVD diamond-coated tool inserts. In
addition, the AX6500 is ideally suited for robotic tool handling in a production environment.

Features:

	Deposits CVD diamond films at growth rates and uniformity necessary for practical, cost effective tooling applications
	Enables pilot production of CVD diamond-coated tools
	Provides a path to full-scale production
	Includes proprietary process knowledge which significantly shorten the user's learning curve.
	Easy to use
	Available with extensive after-sales service and support for high reliability and uptime

AX6500 8kw
Semi-Production Model

--Options--

*	Optical Emission Spectrometer
*	Remote Raman Spectrometer
*	Additional Gas Channels
*	Biasing capabilities
*	Temperature Measurement System (In-situ nucleation monitoring)
*	Turbo Pump

AX6600 Microwave Plasma CVD System

The AX6600 microwave plasma system is designed to operate with plasma at high power densities for large area, high deposition rate processes to meet the scale-up needs for diamond coated tool insert manufacturers. This complete turnkey system incorporates the latest microwave technology with computer control for ease of use.
A large batch size, covering an area of 8 inches in diameter, can be processed all at once. It is a highly flexible design which can be operated in a wide range of power from 15kW to 100kW.

Features:

	Large throughput
	Easy to use
	Production capability
	Computer-controlled, turnkey operation
	Reliable, stable reproducible,versatile operation
	Extensive after-sales process support and training

Specifications of different models

System Model	AX5200	AX5250	AX6500	AX6600
Reactor Type	Plasma Immersion	Plasma Immersion	Plasma Immersion	Plasma Immersion
Usage	R&D	R&D	Production	Production
Stage Heated or Cooled	Heated	Cooled	Cooled	Cooled
RF Power	1.5kW	5kW	8kW	60 - 100kW
RF Frequency	2.45GHz	2.45GHz	2.45GHz	915MHz
Typical Diameter	50mm	50mm	64mm dia. Thermal 100mm dia. Tools	200mm
Max Diameter	100mm	100mm	125mm	300mm
Typical Growth Rate	0.1-0.5µm/hr	Up to 7µm/hr	Up to 7µm/hr	Up to 15µm/hr
Typical Mass Rate	1-4mg/hr	60mg/hr	90mg/hr	1g/hr

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