 |
| Research
and Development at Seki Technotron Corp. |
 |
Seki has assembled a world-class group of scientists
and engineers, expert in microwave plasma technology, who are supported
by experienced production, applications, and customer service teams.
Seki employees are committed to maintaining long-term relationship
with customers and using their feedback to provide technologically
superior products.
Seki R&D team is always committed to support the research being
carried out by our customers and is also open for discussion and
collaboration, related to our products. The ongoing activities include:
| (1)
|
Development of our microwave plasma CVD
equipments to suit to the customer oriented problems. |
| (2) |
Inventing new deposition regimes of growth
in our microwave plasma CVD equipments. |
| (3) |
Collaborating with well-established laboratories
in the world to find new applications for the material grown
using microwave plasma CVD equipments. |
| (4) |
Developing standard recipes to be given with
the microwave plasma CVD equipment for the growth of nanocrystalline
diamond and CNT. |
| (5) |
Large area and uniform growth of diamond,
nanocrystalline diamond and CNT. |
Publications, application notes and technical reports.
| (i) Published
|
| 1. |
T. Sharda and S. Bhattacharyya,
"Advances in Nanocrystalline Diamond",
To appear in Encyclopedia of Nanoscience and Nanotechnology,
Ed. by H. S. Nalwa (American Scientific Publishers,
California, USA), 2003. |
| 2. |
T. Sharda and T. Soga, “Synthesis
of Nanocrystalline Diamond Films by Biased Enhanced
Growth”, To appear in ‘Recent developments
in Applied Physics and Material Science` Ed. by
S. Bhattacharyya (Transtech World Publication),
2003. |
| 3. |
T. Sharda, T. Soga, T. Jimbo,
"Optical Properties of Nanocrystalline Diamond
Filmsby Prism Coupling" To appear in J. Appl.
Phys. 93, 101 (2003). |
| 4. |
T. Sharda, T. Soga, T. Jimbo,
M. Umeno, "Highly Stressed Carbon Film Coatings
on Silicon: Potential Applications" Appl.
Phys. Lett. 80, 2880 (2002). |
| 5. |
T. Sharda, T. Soga, T. Jimbo,
M. Umeno, "Effect of Substrate Holder Boundaries
on Reproducibility of Bias-enhanced Nucleation"
Thin Solid Films 406, 70 (2002). |
| 6. |
T. Soga, T. Sharda, T. Jimbo,
M. Umeno, "Deposition and Characterization
of Nanocrystalline Diamond Films on Mirror-Polished
Si Substrate by Biased Enhanced Microwave Plasma
Chemical Vapor Deposition" International
Journal of Modern Physics B 16, 845 (2002). |
| 7. |
T. Sharda, T. Soga, T. Jimbo,
M. Umeno, "Thermal Stability of Nanocrystalline
Diamond Films Grown by Microwave Plasma Chemical
Vapor Deposition " J. Nanosci. and Nanotech.
1, 287 (2001). |
| 8. |
T. Sharda, T. Soga, T. Jimbo,
M. Umeno, "StrongAdhesion in Nanocrystalline
Diamond Films on Silicon Substrates" J. Appl.
Phys., 89, 4874 (2001). |
| 9. |
T. Sharda, T. Soga, T. Jimbo,
and M. Umeno, "Growth of Nanocrystalline
Diamond Films by Biased Enhanced Microwave Plasma
Chemical Vapor Deposition", Diam. Relat.
Mater. 10, 1592 (2001). |
| 10. |
T. Sharda, M. M. Rahaman, Y. Nukaya,
T. Soga, T. Jimbo, and M. Umeno, Structural and
Optical Properties of Diamond and, Nano-diamond
Films Grown by Microwave Plasma Chemical Vapour
Deposition ", Diamond and Relat. Mater. 10,
561 (2001). |
| 11. |
T. Sharda, T. Soga, T. Jimbo,
and M. Umeno, "High Compressive Stress in
Nanocrystalline Diamond Films Grown by Microwave
Plasma Chemical Vapour Deposition", Diamond
and Relat. Mater. 10, 352 (2001). |
| 12. |
T. Sharda, T. Soga, T. Jimbo,
M. Umeno, "Growth of Nanocrystalline Diamond
Films by Biased Enhanced Microwave Plasma Chemical
Vapor Deposition: A Different Regime of Growth"
Appl. Phys. Letters 77, 4304 (2000). |
| 13. |
T. Sharda, T. Soga, T. Jimbo,
and M. Umeno, "Biased Enhanced Growth of
Nanocrystalline Diamond Film by Microwave Plasma
Chemical Vapor Deposition", Diamond and Relat.
Mater., 9, 1331 (2000). |
| |
|
| (ii) Communicated/In
Preparation.. |
| 1. |
T. Sharda and T. Soga, "A
different region of nanostructured diamond film
growth", Submitted to Journal, 2003. |
|
|
For more details on the ongoing research activities and collaboration
and for the reprints of the above articles, please contact Dr.
Tarun Sharda, manager, R&D. |
|
